Characterization of CdO film AFM and XRD Diffraction Using Rietveld Refinement
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Abstract
Nano particles of Cadmium Oxide (CdO) thin films were prepared by spray pyrolysis technique. The synthesized film is annealed at (200 , 300, 450) o C for 3 hours . The XRD and AFM for the analysis of its structural and micro-structural characteristic has been preformed. The average grain size was found to be about 32.50 nm .There is a preferred orientation along (200) plane with texture coefficient 1.79, 1.644, 1.763 and 1.792 for deposited and annealed films, corresponding to grain size 57,58 ,51 and 51 nm. The variations of stress with temperature is ranged from 0.157 - 0.376 GPa .
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How to Cite
[1]
Al-Dhahir, T.A. and Khodair, Z.T. 2017. Characterization of CdO film AFM and XRD Diffraction Using Rietveld Refinement. Ibn AL-Haitham Journal For Pure and Applied Sciences. 27, 1 (Apr. 2017), 83–92.
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Physics
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