The Study Of Thickness And Annealing Temperature Effect On Structural and Optical Properties For ZnO Thin Films

Abstract

  In the present work, We study the structural and optical properties of (ZnO), which are prepared by thermal evaporation technique, where deposit (Zn) on glass substrates at different thicknesses (150,250,350)nm, deposited on glass substrate at R.T. with rate (5 nm sec-1). And then we make oxidation for (Zn) films at temperature (500) and using the air for one hour, and last annealing samples at temperature (400,500) for one hour. The investigation of (XRD) indicates that the (ZnO) films are polycrystalline type of hexagonal with a preferred orientation along (002) to all samples and analysis reveals that the intensity of this orientation increases with the increase of the thickness and annealing temperature.     Optical properties measurement Transmittance (T) and Absorptance (A) of (ZnO) film show that the transmittance decreases with the increase of thickness and it increases after annealing, where high transmittance(92%) to thickness (150)nm is annealed at temperature (500) with wave length (800-1100)nm, which is suitable to solar cell. Optical energy bands gap is measured and investigated that it increases with the increase of thickness and annealing temperature.